PARTICLE DEPOSITION MEASUREMENT FOR CONTINUOUS MONITORING OF CLEAN PROCESSES

BRINGING PARTICLES TO LIGHT
July 5, 2024 by
PARTICLE DEPOSITION MEASUREMENT FOR CONTINUOUS MONITORING OF CLEAN PROCESSES
Fastmicro B.V.
Particle contamination monitoring and cleanliness control are fundamental to micromanufacturing processes across diverse industries to achieve cost-effective production of high-quality and reliable microscale devices and components. However, practice learns that producing in an ISO class cleanroom does not automatically guarantee a clean manufacturing process or product. By implementing cleanroom environments in combination with continuous particle deposition monitoring, manufacturers can design closed-loop clean process validation and process improvement procedures to prevent particle defects that lead to yield losses. This article introduces technology for cleanroom validation and qualification on the workspace where it really matters, using a Particle Fallout Scanner (PFS) that continuously measures particles falling onto critical target surfaces.

  YOLANDA VILLANUEVA-PALERO AND NIELS LEIBBRANDT  

Introduction

Microtechnology drives many technological advancements and is enabled by the production of highly precise and miniaturized components and devices on (sub)micrometer

and smaller scales. Its applications span across many HighTech industries, pushing the boundaries of what is possible with modern manufacturing techniques. Particle deposition in cleanrooms is a critical concern in microtechnology manufacturing, as even minute contaminants can significantly affect the performance of microscale devices and cause considerable yield losses. The mechanisms by which particles (visible and invisible, see Figure 1) are generated, transported and deposited in cleanrooms involve various physical and environmental factors. Understanding and continuous quantitative monitoring of these mechanisms are required to develop effective particle contamination control strategies, provide direct feedback to cleanroom operators and maintain cleanliness of the manufactured products [1, 2].



Figure 1


This article introduces the case for cleanroom qualification and process monitoring on the workplace itself, according to the standard ISO 14644-17: Particle deposition rate applications. This is achieved by using a Particle Fallout Scanner that continuously measures the particles falling onto critical target surfaces at the same particle-size levels down to 0.5 μm as those that apply for the Airborne Particles Counter (APC) measurements according to the ISO 14644-1 cleanroom standard.

DSPE published Mikroniek Article




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