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DTSTART:20001029T030000
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BEGIN:VEVENT
UID:20260430T195636Z - 57401@eupp283
DTSTART;TZID=Europe/Amsterdam:20240617T093000
DTEND;TZID=Europe/Amsterdam:20240619T203000
CREATED:20260430T195636Z
DESCRIPTION:<a href="https://www.fast-micro.com/event/39th-mask-and-lithogr
 aphy-conference-2024-13">39th Mask and Lithography Conference 2024</a>\nTh
 e EMLC Conference annually brings together scientists\, researchers\, engi
 neers and technicians from research institutes and companies from around t
 he world to present their latest findings in mask and lithography techniqu
 es. The EMLC Conference is dedicated to research\, technology and related 
 processes. It provides an overview of the current state of mask and lithog
 raphy technologies and future strategy. Here\, mask manufacturers and user
 s have the opportunity to familiarize themselves with the latest developme
 nts and results. May we offer you a fancy quick look through the telescope
 ? Here is a brief preview of the conference programme: The EMLC Conference
  2024 will take place in the wonderful setting of MINATEC at CEA-Leti in G
 renoble\, France. The conference will start on Monday\, June 17th at 2 PM 
 with a Tutorial Session\, followed by a Session with student presentations
 . From 7 PM to 9 PM there will be a EMLC 2024 Get Together event at the MI
 NATEC site. On Tuesday\, June 18th\, the conference will be continued at 9
  AM in the MINATEC Platine Auditorium with a 1st Plenary Session\, followe
 d by a Session on Data Analytics. In the afternoon\, there will be Session
 s on DUV and EUV Lithography and Mask Patterning and Processing\, followed
  by the Poster Session. On Wednesday\, June 19th\, EMLC 2024 is continued 
 at 9 AM with the 2nd Plenary Session followed by a Session on Nano-Imprint
  Lithography. After lunch\, there are Sessions on Mask Metrology\, Tuning 
 and Inspection and Optical & Electron Beam Direct Write. The 12th Session 
 will complete the conference. The title of this Session will focus on a no
 vel topic.
DTSTAMP:20260430T195636Z
LOCATION:Grenoble\, France
SUMMARY:39th Mask and Lithography Conference 2024
X-ALT-DESC;FMTTYPE=text/html:<a href="https://www.fast-micro.com/event/39th
 -mask-and-lithography-conference-2024-13">39th Mask and Lithography Confer
 ence 2024</a>\nThe EMLC Conference annually brings together scientists\, r
 esearchers\, engineers and technicians from research institutes and compan
 ies from around the world to present their latest findings in mask and lit
 hography techniques. The EMLC Conference is dedicated to research\, techno
 logy and related processes. It provides an overview of the current state o
 f mask and lithography technologies and future strategy. Here\, mask manuf
 acturers and users have the opportunity to familiarize themselves with the
  latest developments and results. May we offer you a fancy quick look thro
 ugh the telescope? Here is a brief preview of the conference programme: Th
 e EMLC Conference 2024 will take place in the wonderful setting of MINATEC
  at CEA-Leti in Grenoble\, France. The conference will start on Monday\, J
 une 17th at 2 PM with a Tutorial Session\, followed by a Session with stud
 ent presentations. From 7 PM to 9 PM there will be a EMLC 2024 Get Togethe
 r event at the MINATEC site. On Tuesday\, June 18th\, the conference will 
 be continued at 9 AM in the MINATEC Platine Auditorium with a 1st Plenary 
 Session\, followed by a Session on Data Analytics. In the afternoon\, ther
 e will be Sessions on DUV and EUV Lithography and Mask Patterning and Proc
 essing\, followed by the Poster Session. On Wednesday\, June 19th\, EMLC 2
 024 is continued at 9 AM with the 2nd Plenary Session followed by a Sessio
 n on Nano-Imprint Lithography. After lunch\, there are Sessions on Mask Me
 trology\, Tuning and Inspection and Optical & Electron Beam Direct Write. 
 The 12th Session will complete the conference. The title of this Session w
 ill focus on a novel topic.
END:VEVENT
END:VCALENDAR