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VERSION:2.0
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BEGIN:VTIMEZONE
TZID:Japan
BEGIN:STANDARD
DTSTART:20000101T000000
RRULE:FREQ=YEARLY;BYMONTH=1
TZNAME:JST
TZOFFSETFROM:+0900
TZOFFSETTO:+0900
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BEGIN:VEVENT
UID:20260526T121703Z - 6863@eupp283
DTSTART;TZID=Japan:20241211T180000
DTEND;TZID=Japan:20241214T010000
CREATED:20260526T121703Z
DESCRIPTION:<a href="https://www.fast-micro.com/event/semicon-japan-18">SEM
 ICON® JAPAN</a>\nWe are honored to invite you to visit our booth (#3622) 
 at SEMICON Japan\, taking place from December 11 to 13\, 2024. Fastmicro w
 ill be showcasing the latest advancements in high-throughput surface parti
 cle inspection at sub-microscales\, which can significantly enhance defect
 ivity performance and yield. Our scanners are currently being utilized by 
 the world's leading Semicon lithography manufacturer and developed in coll
 aboration with the metrology experts of TNO. These scanners can precisely 
 measure particle deposition or particles on large surfaces (such as EUV pe
 llicle/reticle and 6/8/12” wafer sizes) from both the top and bottom sid
 es. If you are seeking a fast solution to visualize and quantify surface p
 article contamination for mitigation\, Fastmicro can truly make a differen
 ce. COME VIST US NL Pavilion | Tokyo Big Sight East 3 | Booth #3622 We are
  thrilled to meet you this year!
DTSTAMP:20260526T121703Z
LOCATION:Tokyo Big Sight
SUMMARY:SEMICON® JAPAN
X-ALT-DESC;FMTTYPE=text/html:<a href="https://www.fast-micro.com/event/semi
 con-japan-18">SEMICON® JAPAN</a>\nWe are honored to invite you to visit o
 ur booth (#3622) at SEMICON Japan\, taking place from December 11 to 13\, 
 2024. Fastmicro will be showcasing the latest advancements in high-through
 put surface particle inspection at sub-microscales\, which can significant
 ly enhance defectivity performance and yield. Our scanners are currently b
 eing utilized by the world's leading Semicon lithography manufacturer and 
 developed in collaboration with the metrology experts of TNO. These scanne
 rs can precisely measure particle deposition or particles on large surface
 s (such as EUV pellicle/reticle and 6/8/12” wafer sizes) from both the t
 op and bottom sides. If you are seeking a fast solution to visualize and q
 uantify surface particle contamination for mitigation\, Fastmicro can trul
 y make a difference. COME VIST US NL Pavilion | Tokyo Big Sight East 3 | B
 ooth #3622 We are thrilled to meet you this year!
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