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About us.
Designed around one DNA.
Who we are.
Fastmicro was founded on over 15 years of dedicated research and collaboration with the research institute TNO, focusing on groundbreaking technologies for measuring particles on surfaces. Since then, we have become a global provider of innovative solutions and hold a leading position in the sector. With installations worldwide, we are helping to shape the future of cleanliness control in high-tech environments. We maintain a close relationship with our clients across the entire supply chain, ensuring that our technologies and support meet the evolving demands of the industry.
From the demo center at our headquarters in the Brainport Eindhoven region, we showcase not only our product range for particle contamination control but also use the facility as a hub for continuous innovation, cleanliness research, and technical feasibility studies. It's here that we refine our metrology solutions for surface particle measurements, ensuring each system we deliver is tailored to the specific needs of our clients.
Our commitment to research-driven innovation continues to guide our growth and the development of new solutions.
This is our DNA.
At Fastmicro we help our customers to overcome today’s cleanliness challenges in microtechnology.
Accurate
Calibrated from 0.5 µm on NIST-certified PSL
particles. Carefulness is a core value; it shows in everything we build and do.
Fast
Imaging in seconds, results in under a minute. The
same pace when you need an answer or an engineer.
Quantified
Numbers instead of opinions: objective digital output in our measurements, and the same clarity in our specs and commitments.
Consistent
Reproducible measurements, time after time, from
our systems and from our people.
Easy to operate
Operator-independent by design, and a company
that's just as easy to work with.
High throughput
Measurement without interrupting production;
support without slowing you down.
Fastmicro
in short.
2019 • 15 years of research turn to reality
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2024 • Launching real-time monitoring in seconds
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2026 • Fast wafer particle defect inspection made possible
The
Fastmicro Particle Defect Inspection System (PDS) provides high-throughput
surface particle contamination inspection for wafer manufacturing processes,
next generation compound semiconductors and advanced packaging applications.
With >
0.2 μm particle size sensitivity, the PDS range offers an efficient and
supported option to replace legacy particle inspection systems with a
state-of-the-art, robust solution.
