SPIE Advanced Lithography + Patterning is one of the world’s leading technical conferences dedicated to semiconductor lithography, patterning technologies, and advanced manufacturing processes. The event brings together researchers, engineers, and industry leaders from across the global semiconductor ecosystem.

The conference focuses on the latest developments in:

• Advanced lithography techniques (EUV, DUV, next-generation patterning)

• Process control, metrology, and yield optimization

• Materials, resists, and contamination-sensitive manufacturing steps

• Innovations shaping future semiconductor nodes

With a strong mix of technical papers, expert presentations, and industry discussions, SPIE Advanced Lithography + Patterning is a key knowledge-sharing platform for organizations working at the forefront of semiconductor manufacturing.

Fastmicro will follow developments presented at SPIE Advanced Lithography + Patterning 2026, where process cleanliness, contamination control, and surface particle measurement play a critical role in enabling advanced lithography and high-yield production.