SPIE Advanced Lithography
Join Fastmicro at SPIE Advanced Lithography + Patterning 2025
Event Overview:
SPIE Advanced Lithography + Patterning is the premier global conference for professionals in lithography, metrology, and EUV technology. The event brings together industry leaders, researchers, and engineers to address the latest challenges and advancements in semiconductor patterning technologies and materials.
Event Highlights:
- 2,200+ attendees from across the industry
- 50+ exhibitors showcasing cutting-edge technologies
- 500+ technical papers from leading researchers
- Expert-led courses to keep you and your team up to date
Key Topics Covered:
- Optical and EUV Nanolithography
- DTCO and Computational Patterning
- Metrology, Inspection, and Process Control
- Novel Patterning Technologies
- Advances in Patterning Materials and Processes
- Advanced Etch Technology and Process Integration for Nanopatterning
Visit Fastmicro
If you’re attending SPIE Advanced Lithography + Patterning, we invite you to visit Fastmicro at Booth during the exhibition on Tuesday and Wednesday. We will be showcasing our latest advancements in surface particle inspection, designed to support defect reduction and yield improvement through earlier in-process contamination control.
Join Our Poster Session
We’re also presenting a poster session on Wednesday evening, where we will introduce an accelerated workflow for particle root-cause analysis in cleanliness validation of critical parts and tool surfaces.
Let’s Connect!
If contamination control is a key focus for you, we’d love to discuss how our solutions can support your needs. Feel free to stop by our booth or schedule a meeting with our team during the conference.
We look forward to seeing you in San Jose!